Non-Crystallizing Silica GHX-CON-POL-SIL-002
| Parameter | Details |
|---|---|
| Product Name | Non-Crystallizing Silica GHX-CON-POL-SIL-002 |
| Brand | G-Hexa |
| Form | Liquid Suspension |
| Material | Colloidal Silica (SiOβ) |
| Particle Size | 50 nm |
| pH Level | 10.2 (Alkaline) |
| Function | Chemical-Mechanical Polishing (CMP) |
| Crystallization | Non-Crystallizing Formulation |
| Packaging Options | 500 ml, 1000 ml, 1.9 L |
| Order Numbers | 06.07.310 (500 ml), 06.07.320 (1000 ml), 06.07.322 (1.9 L) |
| Application Compatibility | Non-Ferrous Metals, Aluminium, PCBs, ICs, Electronics |
| Finish Quality | Ultra-Fine, Mirror Finish (Final Polishing Stage) |
Payment. Secure payments via Bank Transfer, UPI, Credit/Debit Card, and approved Institutional PO. Flexible terms available for bulk and research orders.
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Description
G-Hexa Non-Crystallizing Silica GHX-CON-POL-SIL-002 is a high-performance final polishing suspension designed for precision surface finishing across a wide range of materials. With a stable non-crystallizing colloidal silica formulation and controlled pH of 10.2, it delivers efficient chemical-mechanical polishing (CMP) action. It is ideal for achieving ultra-smooth, defect-free surfaces on non-ferrous metals, aluminium, PCBs, and integrated circuits, making it highly suitable for advanced laboratory and industrial applications.
Specifications
| Parameter | Details |
|---|---|
| Product Name | Non-Crystallizing Silica GHX-CON-POL-SIL-002 |
| Brand | G-Hexa |
| Form | Liquid Suspension |
| Material | Colloidal Silica (SiOβ) |
| Particle Size | 50 nm |
| pH Level | 10.2 (Alkaline) |
| Function | Chemical-Mechanical Polishing (CMP) |
| Crystallization | Non-Crystallizing Formulation |
| Packaging Options | 500 ml, 1000 ml, 1.9 L |
| Order Numbers | 06.07.310 (500 ml), 06.07.320 (1000 ml), 06.07.322 (1.9 L) |
| Application Compatibility | Non-Ferrous Metals, Aluminium, PCBs, ICs, Electronics |
| Finish Quality | Ultra-Fine, Mirror Finish (Final Polishing Stage) |







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