Non-Crystallizing Silica GHX-CON-POL-SIL-001

Parameter Details
Product Name Non-Crystallizing Silica GHX-CON-POL-SIL-001
Brand G-Hexa
Form Liquid Suspension
Material Colloidal Silica (SiOβ‚‚)
Particle Size 50 nm
pH Level 10.5 (Alkaline)
Function Chemical-Mechanical Polishing (CMP)
Crystallization Non-Crystallizing Formulation
Packaging Options 500 ml, 1000 ml, 5000 ml
Order Numbers 06.05.310 (500 ml), 06.05.320 (1000 ml), 06.05.330 (5000 ml)
Application Compatibility Titanium, Stainless Steel, Metals, Alloys
Finish Quality Ultra-Fine, Mirror Finish (Final Polishing Stage)
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Description

G-Hexa Non-Crystallizing Silica GHX-CON-POL-SIL-001 is a high-performance colloidal silica suspension designed for final-stage precision polishing. With a stable non-crystallizing formulation and controlled alkaline pH of 10.5, it delivers effective chemical-mechanical polishing (CMP) action. Ideal for achieving ultra-smooth, defect-free surfaces on titanium, stainless steel, and other advanced materials, it ensures consistent mirror-quality finishing in metallography and precision manufacturing applications.

Specifications

Parameter Details
Product Name Non-Crystallizing Silica GHX-CON-POL-SIL-001
Brand G-Hexa
Form Liquid Suspension
Material Colloidal Silica (SiOβ‚‚)
Particle Size 50 nm
pH Level 10.5 (Alkaline)
Function Chemical-Mechanical Polishing (CMP)
Crystallization Non-Crystallizing Formulation
Packaging Options 500 ml, 1000 ml, 5000 ml
Order Numbers 06.05.310 (500 ml), 06.05.320 (1000 ml), 06.05.330 (5000 ml)
Application Compatibility Titanium, Stainless Steel, Metals, Alloys
Finish Quality Ultra-Fine, Mirror Finish (Final Polishing Stage)

Key Applications & Uses

G-Hexa Non-Crystallizing Silica is specifically designed for final polishing applications:

  • Final-stage polishing of stainless steel for mirror-like surface finishes
  • Precision finishing of titanium components in aerospace and medical applications
  • Chemical-mechanical polishing (CMP) in metallographic sample preparation
  • Surface refinement of advanced alloys and engineering metals
  • Preparation of ultra-smooth surfaces for microscopy and surface analysis
  • Removal of fine scratches after diamond polishing stages

Why Choose from G-Hexa?

G-Hexa delivers advanced final polishing solutions engineered for precision and reliability:

  • Non-crystallizing formulation ensures stable performance and prevents residue formation
  • Controlled pH of 10.5 enhances chemical-mechanical polishing efficiency
  • Ultra-fine 50 nm particles enable defect-free mirror finishes
  • Optimized for final polishing stage in metallographic workflows
  • Consistent dispersion ensures uniform surface quality
  • Suitable for high-precision research, industrial, and quality control applications

Frequently Asked Questions (FAQs)

Q1. What is non-crystallizing silica?
Non-crystallizing silica remains stable in suspension without forming crystals, ensuring consistent polishing performance and preventing surface contamination.

Q2. What is this product mainly used for?
It is primarily used for final polishing to achieve ultra-smooth, mirror-quality surfaces.

Q3. Which materials can it be used on?
It is suitable for titanium, stainless steel, metals, and various alloys.

Q4. What is the benefit of 50 nm particle size?
The ultra-fine 50 nm particles enable extremely smooth surface finishing and removal of micro-scratches.

Q5. Is this a chemical or mechanical polishing product?
It provides chemical-mechanical polishing (CMP), combining both chemical action and fine abrasive polishing.

Q6. How should it be stored?
Store in a cool, dry place, tightly sealed, and avoid contamination. Shake gently before use to ensure uniform dispersion.

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