Crystallizing Silica GHX-CON-POL-SIL-003

Parameter Details
Product Name Crystallizing Silica GHX-CON-POL-SIL-003
Brand G-Hexa
Form Liquid Suspension
Material Colloidal Silica (SiOβ‚‚)
Particle Size 50 nm
pH Level 10.2 (Alkaline)
Function Chemical-Mechanical Polishing (CMP)
Formulation Type Crystallizing Silica Suspension
Packaging Options 500 ml, 1000 ml
Order Numbers 06.07.520 (500 ml), 06.07.523 (1000 ml)
Application Compatibility Tin, Aluminium, Aluminium-Magnesium Alloys, PCBs, ICs, Non-Ferrous Metals
Finish Quality Ultra-Fine, Mirror Finish (Final Polishing Stage)
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Description

G-Hexa Crystallizing Silica GHX-CON-POL-SIL-003 is a high-performance final polishing fluid designed for precision finishing of soft and non-ferrous materials. Formulated as a 10.2 pH silica suspension, it delivers controlled chemical-mechanical polishing (CMP) action for enhanced surface quality. It is especially effective for tin, aluminium, aluminium-magnesium alloys, and advanced electronic materials such as PCBs and ICs, ensuring smooth, defect-free, mirror-grade finishes.

Specifications

Parameter Details
Product Name Crystallizing Silica GHX-CON-POL-SIL-003
Brand G-Hexa
Form Liquid Suspension
Material Colloidal Silica (SiOβ‚‚)
Particle Size 50 nm
pH Level 10.2 (Alkaline)
Function Chemical-Mechanical Polishing (CMP)
Formulation Type Crystallizing Silica Suspension
Packaging Options 500 ml, 1000 ml
Order Numbers 06.07.520 (500 ml), 06.07.523 (1000 ml)
Application Compatibility Tin, Aluminium, Aluminium-Magnesium Alloys, PCBs, ICs, Non-Ferrous Metals
Finish Quality Ultra-Fine, Mirror Finish (Final Polishing Stage)

Key Applications & Uses

G-Hexa Polycrystalline Diamond Paste is ideal for demanding polishing applications:

  • Fast material removal in metallographic sample preparation
  • Surface finishing of hardened metals and alloys
  • Precision polishing of ceramics and carbide materials
  • Semiconductor and electronic component polishing
  • Step-wise polishing from coarse to fine finishes
  • Tool room and research laboratory polishing applications

Why Choose from G-Hexa?

G-Hexa delivers advanced diamond polishing compounds designed for speed and consistency:

  • Polycrystalline diamond provides multiple cutting edges for faster polishing
  • Improved surface finish compared to monocrystalline pastes at similar grit sizes
  • Water-based formulation ensures easy handling and cleaning
  • Consistent particle distribution for repeatable results
  • Ideal for high-throughput laboratory and industrial workflows
  • Reliable performance across a wide range of materials

Frequently Asked Questions (FAQs)

Q1. What is the advantage of polycrystalline diamond paste?
Polycrystalline diamond particles have multiple cutting edges, enabling faster material removal and improved surface finish.

Q2. What materials can this paste be used on?
It is suitable for metals, ceramics, carbides, semiconductors, and composite materials.

Q3. Which grit size should I choose?
9 ΞΌm and 6 ΞΌm are used for initial polishing, 3 ΞΌm for intermediate steps, and 1 ΞΌm for fine finishing.

Q4. Is this paste suitable for manual polishing?
Yes, it is ideal for both manual and machine polishing applications due to its controlled consistency.

Q5. Does it provide better results than monocrystalline paste?
Yes, it generally offers faster polishing rates and improved surface finishes due to its multi-edge particle structure.

Q6. How should the product be stored?
Store in a cool, dry place with the container tightly sealed to maintain quality and prevent contamination.

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